Retention of Deformable Particles

For the development, assessment, and implementation of engineered particle materials in the fields of sustainability, energy, and the environment, it is crucial to have an understanding of the transport and retention characteristics of soft deformable particles on a micro-scale.

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The application of cartridges to maintain deformable particles is critical in the manufacturing process of the semiconductor.

Different manufacturing processes require effective removal of particles and impurities to ensure product quality and process stability.

CMP (Chemical Mechanical Planarization)

CMP is a key technology in the microelectronics manufacturing process, enabling advanced multi-interconnect level semiconductor devices.CMP lapping solution flattens the wafer surface by chemical and mechanical action on a special tool (polisher).

A well-designed  filter removes large particles and agglomerates from the CMP lapping solution, preventing them from landing on the wafer surface and causing scratches, while allowing the working particles in the lapping solution to pass through the cartridge.



As semiconductor linewidths shrink, the technical limitations of lithography are increasingly challenging, requiring new photoresists and lithography chemicals with more stringent impurity specifications.

For photoresists, ultrapure water and certain organic solvents, special cartridges and purifiers can remove hard particles, soft particles and certain ionic contaminants, thus reducing defects in the photoresist coating process.

Film – Electrochemical Copper Plating

In the back-end metallization process, copper is deposited by a highly controlled electrochemical deposition (plating) process.

Filter plays an important role in removing particles from the electrolyte (copper sulfate) to ensure that the deposited copper is essentially particle-free. Some cartridges with high surface energy, some with hydrophilic properties, are effective in removing particles.


Water is widely used in manufacturing processes in the semiconductor and other microelectronics industries. Ultrapure water is used to rinse process chemicals off of wafers in clean applications and is also used to mix with ultrapure more concentrated process chemicals to dilute a specific process.

Filters require protection of reverse osmosis membranes from particles, capture of fine particles in ion exchange resin beds, and to provide ultimate particle removal in wafer rinse applications.

Separation Goals

Remove particulates and agglomerates while leaving abrasive components

Application Requirements

Selecting the appropriate cartridge and filter

  • Filters must have low extractables, not to introduce foreigners.
  • Filters must be flushed by pure water, to keep TOC under acceptable level.
  • Terminal filters must keep reliable retention of particulates for a long time.
  • Filters must provide consistent high flow rates and be robust to satisfy mass manufacturing processes.

What Sanitek can do in this procedure?

By ensuring the functionality and durability of your equipment, Sanitek’s tailored filtration solutions contribute to long-term cost savings on maintenance and operational expenses.

Sanitek’s market-leading filtration systems specialize in the removal of oil and particles from water streams, addressing environmental regulations or injection well standards. Our innovative offerings encompass oil adsorptive guard filters, high-efficiency coalescers, as well as disposable and washable solid cartridge solutions.

For this specific application, Sanitek designs and manufactures filter cartridges and filter housings. Our Oltek pleated filter cartridge and Oltek string wound filter cartridge stand out as ideal solutions for maintaining the required purity levels in this condition.

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